Chemical vapor deposition(CVD) is one of the important methods for diamond growth. During the processes of deposition, activated gas-phase carbon-containing precursor is transmitted to the substrate to form diamond lattice. This generally involves thermal (e.g. hot filament) or plasma (D.C., R.F., or microwave) activation, or use of a combustion flame (oxyacetylene or plasma torches).
The resulting films are polycrystalline, and the growth rates for the various deposition processes vary considerably, and it is usually found that higher growth rates can be achieved only at the expense of a corresponding loss of film quality.
CVD diamond like CVD diamond dresser has many excellent properties compared with other materials in terms of chemical and physical aspects, and shares almost all unique properties of natural diamond. Here is a table about some parameters of diamond properties.

CVD(Chemical vapor deposition) diamond dresser can be used in many fields, such as:
1. Heat spreader for electronic packaging of high power laser diodes, multichip modules, and other microelectronic devices for its high thermal conductivity;
2. Field emission devices for its negative' electron affinity;
3. SAW (Surface acoustic wave) devices for its high SAW velocity;
4. High performance cutting tools for machining non-ferrous metals, plastics, and composite materials because of its extreme hardness, high wear resistance and high thermal conductivity, also wear coatings;
5. Wear-resistant optical windows across a wide range of the electrooptical spectrum;
6. Wear resistance components;
7. Electronic devices - the possibility of doping diamond and so changing it from being an insulator into a semiconductor opens up a whole range of potential electronic applications